JPS50151996A - - Google Patents
Info
- Publication number
- JPS50151996A JPS50151996A JP5211075A JP5211075A JPS50151996A JP S50151996 A JPS50151996 A JP S50151996A JP 5211075 A JP5211075 A JP 5211075A JP 5211075 A JP5211075 A JP 5211075A JP S50151996 A JPS50151996 A JP S50151996A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/68—Arsenic compounds without As—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C07F9/902—Compounds without antimony-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Casings For Electric Apparatus (AREA)
- Reinforced Plastic Materials (AREA)
- Paints Or Removers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46637574A | 1974-05-02 | 1974-05-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50151996A true JPS50151996A (en]) | 1975-12-06 |
| JPS5214277B2 JPS5214277B2 (en]) | 1977-04-20 |
Family
ID=23851515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5211075A Expired JPS5214277B2 (en]) | 1974-05-02 | 1975-05-01 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5214277B2 (en]) |
| BE (1) | BE828669A (en]) |
| DE (2) | DE2559879C2 (en]) |
| FR (1) | FR2269552B1 (en]) |
| GB (2) | GB1516351A (en]) |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887348A (ja) * | 1981-11-20 | 1983-05-25 | 株式会社中川製作所 | 捲取ロ−ラ− |
| JPS58210904A (ja) * | 1982-05-19 | 1983-12-08 | チバ−ガイギ−・アクチエンゲゼルシヤフト | メタロセン錯体を含有する硬化性組成物、その組成物から得られる活性化された先駆物質およびその用途 |
| JPS59152922A (ja) * | 1983-02-18 | 1984-08-31 | Mitsubishi Electric Corp | 高エネルギ−線硬化型樹脂組成物 |
| US5389700A (en) * | 1991-10-30 | 1995-02-14 | Autex, Inc. | Initiator for photopolymerization |
| US5981616A (en) * | 1996-12-13 | 1999-11-09 | Dsm N.V. | Photo-curable resin composition used for photo fabication of three-dimensional objects |
| US6013714A (en) * | 1996-09-20 | 2000-01-11 | Dsm N.V. | Resin composition and fibrous material forming mold |
| US6096796A (en) * | 1996-12-10 | 2000-08-01 | Dsm N.V. | Photo-curable resin composition |
| US6127085A (en) * | 1996-10-14 | 2000-10-03 | Dsm N.V. | Photo-curable resin composition |
| JP2001106648A (ja) * | 1999-08-02 | 2001-04-17 | Nippon Soda Co Ltd | ヨードニウム塩化合物を含有する光硬化性組成物 |
| US6313188B1 (en) | 1996-09-19 | 2001-11-06 | Nippon Soda Co., Ltd. | Photocationically polymerizable composition comprising a polycyclic aromatic compound |
| JP2002256058A (ja) * | 2001-03-01 | 2002-09-11 | Ricoh Co Ltd | 光硬化型エポキシ樹脂組成物および光硬化型表示素子用シール剤 |
| EP1348727A2 (en) | 2002-03-29 | 2003-10-01 | Brother Kogyo Kabushiki Kaisha | Image-receiving layer composition and overcoat layer composition for ink-jet recording |
| US6677390B1 (en) | 1999-08-02 | 2004-01-13 | Nippon Soda Co., Ltd. | Photocurable composition containing iodonium salt compound |
| US6805439B2 (en) | 2001-09-06 | 2004-10-19 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
| US6866376B2 (en) | 2001-09-28 | 2005-03-15 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
| EP1662318A1 (en) | 1999-03-09 | 2006-05-31 | Fuji Photo Film Co., Ltd. | 1,3-dihydro-1-oxo-2H-indene derivative |
| EP1953149A2 (en) | 2002-03-04 | 2008-08-06 | Wako Pure Chemical Industries, Ltd. | A heterocycle-containing onium salt |
| EP1983023A1 (en) | 2007-02-02 | 2008-10-22 | JSR Corporation | Radiation-curable composition, composite and manufacturing method thereof |
| EP2402818A1 (en) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
Families Citing this family (67)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1539192A (en) | 1975-01-27 | 1979-01-31 | Ici Ltd | Photopolymerisable compositions |
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| AU517415B2 (en) * | 1976-07-09 | 1981-07-30 | General Electric Company | Curable polymer composition |
| US4090936A (en) | 1976-10-28 | 1978-05-23 | Minnesota Mining And Manufacturing Company | Photohardenable compositions |
| US4101513A (en) * | 1977-02-02 | 1978-07-18 | Minnesota Mining And Manufacturing Company | Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof |
| GB1587536A (en) | 1977-07-05 | 1981-04-08 | Ciba Geigy Ag | Expoxide resin-impregnated composites |
| GB1587159A (en) | 1977-07-05 | 1981-04-01 | Ciba Geigy Ag | Film adhesives containing an epoxide resin |
| GB1604953A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| NL7812075A (nl) * | 1977-12-16 | 1979-06-19 | Gen Electric | Hardbare, harsbevattende materialen en werkwijze voor het opschuimen hiervan. |
| GB2013208B (en) * | 1977-12-16 | 1982-11-24 | Gen Electric | Heat curable compositions |
| DE2854011C2 (de) * | 1978-12-14 | 1983-04-21 | General Electric Co., Schenectady, N.Y. | Hitzehärtbare Masse und Verfahren zu deren Herstellung |
| US4310469A (en) | 1978-12-29 | 1982-01-12 | General Electric Company | Diaryliodonium salts |
| US4246298A (en) * | 1979-03-14 | 1981-01-20 | American Can Company | Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application |
| DE3029247C2 (de) * | 1979-08-03 | 1996-04-11 | Gen Electric | UV-härtbare Siliconüberzugsmassen, Verfahren zu deren Herstellung und deren Verwendung |
| US4351708A (en) | 1980-02-29 | 1982-09-28 | Ciba-Geigy Corporation | Photochemically or thermally polymerizable mixtures |
| DE3107087A1 (de) * | 1980-02-29 | 1981-12-24 | CIBA-GEIGY AG, 4002 Basel | "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen" |
| US4294746A (en) | 1980-06-17 | 1981-10-13 | Union Carbide Corporation | Stabilizers for cycloaliphatic epoxide containing compositions |
| US4518676A (en) * | 1982-09-18 | 1985-05-21 | Ciba Geigy Corporation | Photopolymerizable compositions containing diaryliodosyl salts |
| US4537725A (en) * | 1982-09-18 | 1985-08-27 | Ciba-Geigy Corporation | Diaryliodosyl salts |
| US4482679A (en) * | 1982-09-18 | 1984-11-13 | Ciba-Geigy Corporation | Heat-curable epoxy compositions containing diaryliodosyl salts |
| EP0153904B1 (de) * | 1984-02-10 | 1988-09-14 | Ciba-Geigy Ag | Verfahren zur Herstellung einer Schutzschicht oder einer Reliefabbildung |
| JPS61190524A (ja) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
| US5194365A (en) * | 1985-06-19 | 1993-03-16 | Ciba-Geigy Corporation | Method for forming images |
| US4786569A (en) * | 1985-09-04 | 1988-11-22 | Ciba-Geigy Corporation | Adhesively bonded photostructurable polyimide film |
| DE3604580A1 (de) * | 1986-02-14 | 1987-08-20 | Basf Ag | Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren |
| CH678897A5 (en]) * | 1986-05-10 | 1991-11-15 | Ciba Geigy Ag | |
| US4751138A (en) | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| US4857437A (en) * | 1986-12-17 | 1989-08-15 | Ciba-Geigy Corporation | Process for the formation of an image |
| US4882201A (en) * | 1988-03-21 | 1989-11-21 | General Electric Company | Non-toxic aryl onium salts, UV curable coating compositions and food packaging use |
| DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
| DE3933420C1 (en]) * | 1989-10-06 | 1991-03-07 | Th. Goldschmidt Ag, 4300 Essen, De | |
| DE4024661C1 (en) * | 1990-08-03 | 1992-04-02 | Th. Goldschmidt Ag, 4300 Essen, De | Tris:tri:fluoromethane:sulphonated complexes - prepd. by mixing boron tri:fluoro:methanesulphonate with onium salt in organic solvent |
| DE4027438C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp. |
| DE4027437C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds. |
| DE4110793C1 (en) * | 1991-04-04 | 1992-04-02 | Th. Goldschmidt Ag, 4300 Essen, De | Organo:polysiloxane - used as photoinitiator in cationically curable organo:polysiloxane compsn. esp. contg. epoxy¨ or vinyl¨ gps. |
| DE4421623A1 (de) * | 1994-06-21 | 1996-01-04 | Thera Ges Fuer Patente | Mehrkomponentige, kationisch härtende Epoxidmassen und deren Verwendung sowie Verfahren zur Herstellung gehärteter Massen |
| JP3442176B2 (ja) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | 光重合性組成物 |
| DE19534594B4 (de) * | 1995-09-19 | 2007-07-26 | Delo Industrieklebstoffe Gmbh & Co. Kg | Kationisch härtende, flexible Epoxidharzmassen und ihre Verwendung zum Auftragen dünner Schichten |
| EP1020479B1 (de) | 1999-01-16 | 2005-08-10 | Goldschmidt GmbH | Photoinitiatoren zur kationischen Härtung |
| GB9921779D0 (en) | 1999-09-16 | 1999-11-17 | Ciba Sc Holding Ag | UV-Curable compositions |
| AU5649400A (en) | 1999-09-21 | 2001-10-11 | Goldschmidt Ag | Photoinitiators containing urethane groups for cationic curing |
| US6756013B1 (en) * | 2000-08-14 | 2004-06-29 | Cornell Development Corporation, Llc | Compositions of iodonium compounds and methods and uses thereof |
| TWI246525B (en) | 2001-11-06 | 2006-01-01 | Wako Pure Chem Ind Ltd | Hybrid onium salt |
| US7709553B2 (en) * | 2003-05-07 | 2010-05-04 | Mitsui Chemicals, Inc. | Photo cation polymerizable resin composition and surface protective material for optical disk |
| DE10341137A1 (de) | 2003-09-06 | 2005-03-31 | Goldschmidt Ag | Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen |
| JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
| EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| JP4474317B2 (ja) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP2006335826A (ja) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
| JP5276264B2 (ja) | 2006-07-03 | 2013-08-28 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法 |
| US8541063B2 (en) | 2007-02-06 | 2013-09-24 | Fujifilm Corporation | Undercoat solution, ink-jet recording method and ink-jet recording device |
| DE602008006279D1 (de) | 2007-02-07 | 2011-06-01 | Fujifilm Corp | Tintenstrahlaufzeichnungsvorrichtung mit Wartungsvorrichtung für Tintenstrahldruckkopf und Wartungsverfahren für einen Tintenstrahldruckkopf |
| JP5224699B2 (ja) | 2007-03-01 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版 |
| JP4898618B2 (ja) | 2007-09-28 | 2012-03-21 | 富士フイルム株式会社 | インクジェット記録方法 |
| JP5265165B2 (ja) | 2007-09-28 | 2013-08-14 | 富士フイルム株式会社 | 塗布装置及びこれを用いるインクジェット記録装置 |
| JP5254632B2 (ja) | 2008-02-07 | 2013-08-07 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物 |
| US20090214797A1 (en) | 2008-02-25 | 2009-08-27 | Fujifilm Corporation | Inkjet ink composition, and inkjet recording method and printed material employing same |
| JP5583329B2 (ja) | 2008-03-11 | 2014-09-03 | 富士フイルム株式会社 | 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体 |
| JP4914862B2 (ja) | 2008-03-26 | 2012-04-11 | 富士フイルム株式会社 | インクジェット記録方法、及び、インクジェット記録装置 |
| JP5350827B2 (ja) | 2009-02-09 | 2013-11-27 | 富士フイルム株式会社 | インク組成物、及び、インクジェット記録方法 |
| JP5349095B2 (ja) | 2009-03-17 | 2013-11-20 | 富士フイルム株式会社 | インク組成物、及び、インクジェット記録方法 |
| JP5530141B2 (ja) | 2009-09-29 | 2014-06-25 | 富士フイルム株式会社 | インク組成物及びインクジェット記録方法 |
| EP2644664B1 (en) | 2012-03-29 | 2015-07-29 | Fujifilm Corporation | Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article |
| US9416220B2 (en) | 2012-05-18 | 2016-08-16 | Cmet Inc. | Resin composition for optical stereolithography |
| JP5980702B2 (ja) | 2013-03-07 | 2016-08-31 | 富士フイルム株式会社 | インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法 |
| JP5939644B2 (ja) | 2013-08-30 | 2016-06-22 | 富士フイルム株式会社 | 画像形成方法、インモールド成型品の製造方法、及び、インクセット |
| US20230051188A1 (en) | 2019-12-18 | 2023-02-16 | 3M Innovative Properties Company | Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3708296A (en) * | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
| AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
| GB1539192A (en) * | 1975-01-27 | 1979-01-31 | Ici Ltd | Photopolymerisable compositions |
-
1975
- 1975-04-16 GB GB1570475A patent/GB1516351A/en not_active Expired
- 1975-04-16 GB GB49878A patent/GB1516352A/en not_active Expired
- 1975-04-26 DE DE19752559879 patent/DE2559879C2/de not_active Expired
- 1975-04-26 DE DE19752518639 patent/DE2518639C3/de not_active Expired
- 1975-04-30 FR FR7513520A patent/FR2269552B1/fr not_active Expired
- 1975-05-01 JP JP5211075A patent/JPS5214277B2/ja not_active Expired
- 1975-05-02 BE BE156012A patent/BE828669A/xx not_active IP Right Cessation
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887348A (ja) * | 1981-11-20 | 1983-05-25 | 株式会社中川製作所 | 捲取ロ−ラ− |
| JPS58210904A (ja) * | 1982-05-19 | 1983-12-08 | チバ−ガイギ−・アクチエンゲゼルシヤフト | メタロセン錯体を含有する硬化性組成物、その組成物から得られる活性化された先駆物質およびその用途 |
| JPS59152922A (ja) * | 1983-02-18 | 1984-08-31 | Mitsubishi Electric Corp | 高エネルギ−線硬化型樹脂組成物 |
| US5389700A (en) * | 1991-10-30 | 1995-02-14 | Autex, Inc. | Initiator for photopolymerization |
| US5480918A (en) * | 1991-10-30 | 1996-01-02 | Autex, Inc. | Initiator for photopolymerization |
| US6313188B1 (en) | 1996-09-19 | 2001-11-06 | Nippon Soda Co., Ltd. | Photocationically polymerizable composition comprising a polycyclic aromatic compound |
| US6013714A (en) * | 1996-09-20 | 2000-01-11 | Dsm N.V. | Resin composition and fibrous material forming mold |
| US6127085A (en) * | 1996-10-14 | 2000-10-03 | Dsm N.V. | Photo-curable resin composition |
| US6096796A (en) * | 1996-12-10 | 2000-08-01 | Dsm N.V. | Photo-curable resin composition |
| US5981616A (en) * | 1996-12-13 | 1999-11-09 | Dsm N.V. | Photo-curable resin composition used for photo fabication of three-dimensional objects |
| US6365644B1 (en) | 1996-12-13 | 2002-04-02 | Dsm N.V. | Photo-curable resin composition used for photo-fabrication of three-dimensional object |
| USRE42593E1 (en) | 1996-12-13 | 2011-08-02 | Dsm Ip Assets B.V. | Photo-curable resin composition used for photo-fabrication of three-dimensional object |
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| EP2402818A1 (en) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2559879C2 (de) | 1982-03-04 |
| FR2269552A1 (en]) | 1975-11-28 |
| DE2518639C3 (de) | 1979-05-23 |
| BE828669A (fr) | 1975-09-01 |
| DE2518639A1 (de) | 1975-11-06 |
| DE2518639B2 (de) | 1978-07-13 |
| GB1516352A (en) | 1978-07-05 |
| JPS5214277B2 (en]) | 1977-04-20 |
| FR2269552B1 (en]) | 1978-09-01 |
| GB1516351A (en) | 1978-07-05 |